In-situ surface-sensitive X-ray diffraction study on the influence of iodide over the selective electrochemical etching of Cu 3Au (111)

Surface Science

Volumn 606, Issue 9-10, 2012, Pages

  Renner, Frank Uwe ^a   Ankah, Genesis Ngwa ^a   Pareek, Aparna ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

Author keywords

Dealloying; Electrochemistry; Iodide; Nanoporous gold; X ray diffraction

Indexed keywords

AFM; AU ISLANDS; AU(1 1 1 ); AZIMUTHAL DOMAINS; DEALLOYING; DISSOLUTION-INHIBITING; EX SITU; IN-SITU; IODIDE; NANO-POROUS; NANOPOROSITY; NANOPOROUS GOLD; OVER POTENTIAL; POROUS FILM; PRISTINE SURFACES; SELECTIVE ETCHING; SEM IMAGE; STRUCTURAL TRANSFORMATION; SYNCHROTRON LIGHT; ULTRA-THIN; X RAY DATA; X-RAY DIFFRACTION STUDIES;

COPPER; DISSOLUTION; ELECTROCHEMISTRY; ELECTROLYTES; SULFURIC ACID; ULTRATHIN FILMS; X RAY DIFFRACTION;

GOLD;

EID: 84858342821     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2012.01.013     Document Type: Article

References (40)

1. H. Kaiser Corros. Sci. 34 1993 683
2. E. Schofield Trans. Inst. Met. Finish. 83 2005 35
3. J. Erlebacher J. Electrochem. Soc. 151 2004 C614
4. G. Tammann Z. Anorg. Allg. Chem. 107 1919 1
5. H. Gerischer, and H. Rickert Z. Metallkd. 46 1955 681
6. L. Graf Z. Metallkd. 46 1955 378
7. H.W. Pickering, and C. Wagner J. Electrochem. Soc. 114 1967 698
8. A.J. Forty Nature 282 1979 597
9. I.C. Oppenheim, D.J. Trevor, Ch.E.D. Chidsey, P.L. Trevor, and K. Sieradzki Science 254 1991 687
10. T.P. Moffat, F.-R.F. Fan, and A.J. Bard J. Electrochem. Soc. 138 1991 3224
11. J. Erlebacher, M.J. Aziz, A. Karma, N. Dimitrov, and K. Sieradzki Nature 410 2001 450
12. J. Weissmuller, R.C. Newman, H.J. Jin, A.M. Hodge, and J.W. Kysar MRS Bull. 34 2009 577
13. A. Wittstock, J. Biener, and M. Baumer J. Phys. Chem. Chem. Phys. 12 2010 12919
14. A. Wittstock, V. Zielasek, J. Biener, C.M. Friend, and M. Baeumer Science 327 2010 319
15. N.A. Senior, and R.C. Newman Nanotechnology 17 2006 2311
16. J. Biener, A. Wittstock, L.A. Zepeda-Ruiz, M.M. Biener, V. Zielasek, D. Kramer, R.N. Viswanath, J. Weissmüller, M. Bäumer, and A.V. Hamza Nat. Mater. 8 2009 47
17. J. Biener, A.M. Hodge, and A.V. Hamza Appl. Phys. Lett. 87 2005 121908
18. D. Kramer, R.N. Viswanath, and J. Weissmuller Nano Lett. 4 2004 793
19. P. Strasser, S. Koh, T. Anniyev, J. Greeley, K. More, C. Yu, Z. Liu, S. Kaya, D. Nordlund, H. Ogasawara, M.F. Toney, and A. Nilsson Nat. Chem. 2 2010 454
20. R. Yang, P. Strasser, and M.F. Toney J. Phys. Chem. C 115 2011 9074
21. Y. Yu, Lin Gu, X. Lang, C. Zhu, T. Fujita, M. Chen, and J. Maier Adv. Mater. 23 2003 2443
22. L.Y. Chen, T. Fujita, Y. Ding, and M.W. Chen Adv. Funct. Mater. 20 2010 2279
23. M. Oezaslan, F. Hasché, and P. Strasser Chem. Mater. 23 2011 2159
24. A. Wittstock, J. Biener, and M. Baeumer Phys. Chem. Chem. Phys. 12 2010 12919
25. J. Rugolo, J. Erlebacher, and K. Sieradzki Nat. Mater. 5 2006 946
26. J. Lipkowski, Z. Shi, A. Chen, B. Pettinger, and C. Bilger Electrochim. Acta 43 1998 2875
27. O.M. Magnussen Chem. Rev. 102 2002 679
28. O.M. Magnussen, and M.R. Vogt Phys. Rev. Lett. 85 2000 357
29. P. Broekmann, N.T.M. Hai, and K. Wandelt J. Appl. Electrochem. 36 2006 1241
30. P. Broekmann, N.T.M. Hai, and K. Wandelt Surf. Sci. 600 2006 3971
31. T. Will, M. Dietterle, and D.M. Kolb A.A. Gewirth, H. Siegenthaler, Nanoscale Probes of the Solid/Electrolyte Interface 1995 Kluwer Dordrecht
32. S. Huemann, N.T.M. Hai, P. Broekmann, K. Wandelt, H. Zajons, H. Dosch, and F.U. Renner J. Phys. Chem. B 110 2006 24955
33. A. Dursun, D.V. Pugh, and S.G. Corcoran J. Electrochem. Soc. 150 2003 B355
34. F.U. Renner, A. Stierle, H. Dosch, D.M. Kolb, T.L. Lee, and J. Zegenhagen Nature 439 2006 707
35. F.U. Renner, A. Stierle, H. Dosch, D.M. Kolb, and J. Zegenhagen Electrochem. Commun. 9 2007 1639
36. F.U. Renner, A. Stierle, H. Dosch, D.M. Kolb, T.L. Lee, and J. Zegenhagen Phys. Rev. B 77 2008 235433
37. A. Pareek, S. Borodin, A. Bashir, G.N. Ankah, G.A. Eckstein, M. Rohwerder, M. Stratmann, Y. Gründer, and F.U. Renner J. Am. Chem. Soc. 133 2011 18264
38. F.U. Renner, Y. Gründer, P.F. Lyman, and J. Zegenhagen Thin Solid Films 515 2007 5574
39. C. Alonso, R.C. Salvarezza, J.M. Vara, and A.J. Arvia Electrochim. Acta 35 1990 1331
40. J.E. Millstone, W. Wei, M.R. Jones, H. Yoo, and C.A. Mirkin Nano Lett. 8 2008 2526