Water-developable poly(2-oxazoline)-based negative photoresists

Macromolecular Rapid Communications

Volumn 33, Issue 5, 2012, Pages 396-400

  Schenk, Verena ^a   Ellmaier, Lisa ^a,b   Rossegger, Elisabeth ^a   Edler, Matthias ^c   Griesser, Thomas ^c   Weidinger, Gerald ^d   Wiesbrock, Frank ^b  

^a POLYMER COMPETENCE CENTER LEOBEN GMBH   (Austria)

^b GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^c UNIVERSITY OF LEOBEN   (Austria)

^d AT&S Austria Technologie & Systemtechnik Aktiengesellschaft   (Austria)

Author keywords

copoly(2 oxazoline)s; photolithography; photoresists

Indexed keywords

2-OXAZOLINE; DRIED POLYMERS; HALOGEN-FREE; MICROWAVE REACTORS; NEGATIVE PHOTORESISTS; POLY(2-OXAZOLINE)S; SIDE-CHAINS; THIOL-ENE REACTIONS; UV IRRADIATION;

NITROGEN COMPOUNDS; PHOTOLITHOGRAPHY; PHOTORESISTS; POLYMER FILMS; QUARTZ;

ORGANIC POLYMERS;

OXAZOLE DERIVATIVE; OXAZOLIDINE; POLYMER;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; PHOTOCHEMISTRY; SYNTHESIS; ULTRAVIOLET RADIATION;

MOLECULAR STRUCTURE; OXAZOLES; PHOTOCHEMISTRY; POLYMERS; ULTRAVIOLET RAYS;

EID: 84858019381     PISSN: 10221336     EISSN: 15213927     Source Type: Journal    
DOI: 10.1002/marc.201100717     Document Type: Article

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