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Journal of Materials Science

Volumn 47, Issue 4, 2012, Pages 1958-1963

Fluorinated polyimide-silica films with low permittivity and low dielectric loss

(6) Zhang, Yihe a Yu, Li a Su, Qingsong a Zheng, Hong a Huang, Haitao b Chan, H L W b

a CHINA UNIVERSITY OF GEOSCIENCES (China)

b HONG KONG POLYTECHNIC UNIVERSITY (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

DISPERSED SILICAS; FLUORINATED POLYIMIDES; HYBRID FILM; LOW DIELECTRIC LOSS; MICROELECTRONIC PACKAGING; POROUS FILM; RELATIVE DIELECTRIC PERMITTIVITY; SILICA PARTICLES; TETRAETHYL ORTHOSILICATES;

DIELECTRIC LOSSES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROFLUORIC ACID; MICROELECTRONICS; PACKAGING MATERIALS; POLYMERIC FILMS; SCANNING ELECTRON MICROSCOPY; SILICA; SOL-GEL PROCESS;

POLYIMIDES;

EID: 84857656479 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-011-5990-x Document Type: Article

Times cited : (30)

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