Photo-oxidative degradation of poly(ethylene-co-vinyl acetate)/nisin antimicrobial films

Polymer Degradation and Stability

Volumn 97, Issue 4, 2012, Pages 653-660

  Scaffaro, Roberto ^a   Botta, Luigi ^a   Gallo, Giuseppe ^a  

^a UNIVERSITY OF PALERMO   (Italy)

Author keywords

Antimicrobial films; EVA; Melt processing; Nisin; Photo oxidation

Indexed keywords

ANTI-MICROBIAL ACTIVITY; ANTI-MICROBIAL AGENT; ANTIMICROBIAL FILMS; ANTIMICROBIAL PROPERTY; BLOWN-FILMS; CO-MONOMER; ELONGATION AT BREAK; EVA; MELT PROCESSING; NISIN; PHOTO-OXIDATIVE DEGRADATION; POLY(ETHYLENE-CO-VINYLACETATE); PROTECTIVE EFFECTS; TENSILE TESTS; UV STABILIZER; VINYL ACETATES;

DEGRADATION; MICROORGANISMS; TENSILE TESTING;

ANTIBIOTICS;

EID: 84857637701     PISSN: 01413910     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymdegradstab.2012.01.003     Document Type: Article

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