Metal-Assisted chemical etching using silica nanoparticle for the fabrication of a silicon nanowire array

Japanese Journal of Applied Physics

Volumn 51, Issue 2 PART 2, 2012, Pages

  Kato, Shinya ^a   Watanabe, Yuya ^a   Kurokawa, Yasuyoshi ^a   Yamada, Akira ^a   Ohta, Yoshimi ^b   Niwa, Yusuke ^b   Hirota, Masaki ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b Nissan Research Center   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOXYL RADICALS; DISPERSED SILICAS; METAL-ASSISTED CHEMICAL ETCHING; NEGATIVE CHARGE; SILICA NANOPARTICLES; SILICON NANOWIRE ARRAYS; SILICON NANOWIRES; TRANSMISSION ELECTRON MICROSCOPE;

ETCHING; NANOWIRES; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY;

METAL NANOPARTICLES;

EID: 84857495998     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.51.02BP09     Document Type: Article

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