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Volumn 41, Issue 2, 2011, Pages 147-155

Indium oxide ALD using cyclopentadienyl indium and mixtures of H 2O and O2

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; FILM PREPARATION;

EID: 84857287551     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3633663     Document Type: Conference Paper
Times cited : (30)

References (17)
  • 2
    • 0000836443 scopus 로고    scopus 로고
    • Atomic Layer Deposition
    • edited by H. S. Nalwa (Academic Press, San Diego)
    • M. Ritala and M. Leskela, 2001, "Atomic Layer Deposition", in Handbook of Thin Film Materials, edited by H. S. Nalwa (Academic Press, San Diego), Vol. 1, pp. 103.
    • (2001) Handbook of Thin Film Materials , vol.1 , pp. 103
    • Ritala, M.1    Leskela, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.