Optimizing substrate surface and catalyst conditions for high yield chemical vapor deposition grown epitaxially aligned single-walled carbon nanotubes

Carbon

Volumn 49, Issue 15, 2011, Pages 5029-5037

  Ibrahim, Imad ^a,b   Bachmatiuk, Alicja ^a   Börrnert, Felix ^a   Blüher, Jan ^b   Wolff, Ulrike ^a   Warner, Jamie H ^c   Büchner, Bernd ^a   Cuniberti, Gianaurelio ^b   Rümmeli, Mark H ^a,b  

^a IFW DRESDEN   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CARBON NANOTUBES; CATALYSTS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH FROM VAPOR; DEPOSITION; NANOTUBES; SINGLE CRYSTALS; SUBSTRATES; VAPOR DEPOSITION; YARN;

ALIGNED CARBON NANOTUBES; ALIGNED SINGLE-WALLED CARBON NANOTUBES; CRYSTALLOGRAPHIC PLANE; GROWTH CONDITIONS; HIGH SPATIAL DENSITY; SMOOTH SUBSTRATES; STRUCTURAL DEFECT; SUBSTRATE SURFACE;

SINGLE-WALLED CARBON NANOTUBES (SWCN);

EID: 84857033442     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2011.07.020     Document Type: Article

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