In situ quartz crystal microbalance measurements of thin protein film plasma removal

Plasma Processes and Polymers

Volumn 9, Issue 2, 2012, Pages 188-196

  Fumagalli, Francesco ^a   Hanuš, Jan ^a   Kylián, Ondřej ^b   Rossi, François ^a  

^a JOINT RESEARCH CENTRE   (Italy)

^b CHARLES UNIVERSITY   (Czech Republic)

Author keywords

decontamination; plasma etching; proteins; quartz crystal microbalance; self limiting etching kinetic; surface

Indexed keywords

CHEMICAL COMPOSITIONS; CONTAMINATION LEVELS; DEPOSIT REMOVAL; DIRECT CONTACT; ETCHING KINETICS; IN-SITU; MASS LOSS; MASS REMOVAL RATE; MORPHOLOGICAL CHANGES; MORPHOLOGICAL MODIFICATION; PLASMA ETCHING PROCESS; PLASMA-INDUCED; PROTEIN FILMS; QUARTZ CRYSTAL; REMOVAL RATE; SELF-LIMITING ETCHING KINETIC; SURGICAL INSTRUMENT; TREATMENT TIME;

DECONTAMINATION; KINETICS; PLASMA ETCHING; PLASMA INTERACTIONS; QUARTZ CRYSTAL MICROBALANCES; SURFACES; SURGICAL EQUIPMENT; TISSUE;

PROTEINS;

EID: 84856890815     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201100098     Document Type: Article

References (29)

1. I. Lipscomb, A. Sihota, C. Keevil, J. Clin. Microbiol. 2006, 44, 3728.
2. H. Murdoch, D. Taylor, J. Dickinson, J. Walker, D. Perrett, N. Raven, J. Sutton, J. Hosp. Infec. 2006, 63, 432.
3. D. Taylor, J. Hosp. Infec. 1999, 43, S69.
4. S. Lerouge, C. Guignot, M. Tabrizian, D. Ferrier, N. Yagoubi, L. Yahia, J. Biomed. Mater. Res. 2000, 52, 774.
5. P. Nair, J. Biomater. Appl. 1995, 10, 121.
6. A. Mazzu, C. Smith, J. Biomed. Mater. 1984, 18, 961.
7. K. Ryan, C. Ray, Sherris Medical Microbiology. McGraw Hill, New York, USA 2004.
8. S. Prusiner, Proc. Natl. Acad. Sci. 1998, 95, 13363.
9. R. Hervé, T. Secker, C. Keevil, J. Hosp. Infec. 2010, 75, 309.
10. M. Moisan, J. Barbeau, S. Moreau, J. Pelletier, M. Tabrizian, L' H. Yahia, Int. J. Pharma. 2001, 226, 1.
11. S. Lerouge, A. C. Fozza, M. R. Wertheimer, R. Marchand, L'. H. Yahia, Plasma Polym 2001, 5, 31.
12. F. Rossi, O. Kylián, M. Hasiwa, Plasma Process. Polym. 2006, 3, 431.
13. F. Rossi, O. Kylián, H. Rauscher, M. Hasiwa, D. Gilliland, New J. Phys. 2009, 11, 115017.
14. A. von Keudell, P. Awakowicz, J. Benedikt, V. Raballand, A. Yanguas-Gil, J. Opretzka, C. Flötgen, R. Reuter, L. Byelykh, H. Halfmann, K. Stapelmann, B. Denis, J. Wunderlich, P. Muranyi, F. Rossi, O. Kylian, N. Hasiwa, A. Ruiz, H. Rauscher, L. Sirghi, E. Comoy, C. Dehen, L. Challier, J. P. Deslys, Plasma Process. Polym. 2010, 7, 327.
15. O. Kylián, H. Rauscher, D. Gilliland, F. Brétagnol, F. Rossi, J. Phys. D: Appl. Phys. 2008, 41, 095201.
16. O. Kylián, H. Rauscher, B. Denis, L. Ceriotti, F. Rossi, Plasma Process. Polym. 2009, 6, 848.
17. S. Prusiner, Science 1991, 252, 1515.
18. I. Lipscomb, R. Hervé, K. Harris, H. Pinchin, R. Collin, C. W. Keevil, J. Gen. Virol. 2007, 88, 2619.
19. I. Lipscomb, J. Hosp. Infec. 2010, 62, 141.
20. M. Buck, Q. Rev. Biophys. 1998, 31, 297
21. X. Shen, C. Ho, T. Wong, J. Phys. Chem. B 2010, 114, 5269.
22. S. Heil, P. Kudlacek, E. Langereis, R. Engeln, M. van de Sanden, W. Kessels, Appl. Phys. Lett. 2006, 89, 131505.
23. F. Rossi, O. Kylian, H. Rauscher, D. Gilliland, L. Sirghi, Pure Appl. Chem. 2008, 80, 1939.
24. G. Friedli, Phd Dissertation. University of Surrey, Guildford, England 1996.
25. G. Baeamson, D. Briggs, High Resolution XPS of Organic Polymers: The Scientia 3000 database, Wiley, Chichester, Sussex, UK 1992.
26. C. Wagner, Handbook of Photoelectron Spectroscopy, Perkin Elmer, Eden Praire, Minnesota, USA 1979.
27. J. Dewez, V. Berger, Y. Schneider, P. Rouxhet, J. Coll. Int. Sci. 1997, 191, 1.
28. J. Benedikt, C. Flötgen, G. Kussel, V. Raballand, A. von Keudell, J. Phys. D: Conf. Ser. 2008, 133, 012012.
29. O. Kylián, J. Benedikt, L. Sirghi, R. Reuter, H. Rauscher, A. von Keudell, F. Rossi, Plasma Process. Polym. 2009, 6, 255.