GeOx and SiOx nanowires grown via the active oxidation of Ge and Si substrates

Journal of Materials Research

Volumn 26, Issue 17, 2011, Pages 2240-2246

  Shalav, Avi ^a   Collin, Gabriel H ^a   Yang, Yi ^a,b   Kim, Taehyun ^a   Elliman, Robert G ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Ge; Nanostructure; Si

Indexed keywords

ACTIVE OXIDATIONS; ANNEALING TEMPERATURES; CATALYTIC NANOPARTICLE; NUCLEATION PROCESS; SI SUBSTRATES; SURFACE OXIDE; THERMODYNAMIC MODEL; UNIFORM NANOWIRES;

CATALYTIC OXIDATION; GERMANIUM; GOLD; GOLD DEPOSITS; NANOSTRUCTURES; NANOWIRES; OXIDATION; SILICON;

SUBSTRATES;

EID: 84856862068     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2011.150     Document Type: Article

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