TiO 2 coating of high surface area silica gel by chemical vapor deposition of TiCl 4 in a fluidized-bed reactor

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 9, 2011, Pages 8152-8157

  Xia, Wei ^a   Mei, Bastian ^a   Sánchez, Miguel D ^a,b   Strunk, Jennifer ^a   Muhler, Martin ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b UNIVERSIDAD NACIONAL DEL SUR   (Argentina)

Author keywords

Chemical vapor deposition; Fluidized bed reactor; Strong oxide oxide interactions; TiO 2

Indexed keywords

ANATASE TIO; BLUE SHIFT; FLUIDIZED BED REACTORS; HIGH RESOLUTION; HIGH SURFACE AREA; POROUS SILICA; POROUS SIO; STRONG INTERACTION; TIO; UV-VIS SPECTRA; UV-VIS SPECTROSCOPY; VACUUM CONDITION;

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COATINGS; FLUID CATALYTIC CRACKING; LOADING; PHYSISORPTION; SILICA GEL; SILICON COMPOUNDS; SUPERSATURATION; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROSCOPY; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM DIOXIDE;

EID: 84856848463     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.5107     Document Type: Conference Paper

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