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Volumn 86, Issue 6, 2012, Pages 672-674
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Laser ablated ZnO layers for ALGaN/GaN HEMT passivation
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Author keywords
AlGaN GaN heterostructures; C HEMT; Laser ablation; Passivation layer; ZnO
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Indexed keywords
ALGAN;
ALGAN/GAN HEMTS;
ALGAN/GAN HETEROSTRUCTURES;
C-HEMT;
CHANNEL AREA;
ELECTRON DRIFT MOBILITY;
FULLY COMPATIBLE;
GATE-LEAKAGE CURRENT;
PASSIVATION LAYER;
PROCESS TECHNOLOGIES;
PULSED-LASER DEPOSITION TECHNIQUE;
THIN LAYERS;
ZNO;
ZNO LAYERS;
CRYSTALS;
DEPOSITION;
DRAIN CURRENT;
ELECTRON MOBILITY;
GALLIUM NITRIDE;
LASER ABLATION;
LEAKAGE CURRENTS;
PASSIVATION;
PULSED LASER DEPOSITION;
PULSED LASERS;
ZINC OXIDE;
HIGH ELECTRON MOBILITY TRANSISTORS;
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EID: 84856519159
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2011.07.028 Document Type: Conference Paper |
Times cited : (3)
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References (7)
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