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Volumn 100, Issue 3, 2012, Pages

Time-dependent degradation of AlGaN/GaN high electron mobility transistors under reverse bias

Author keywords

[No Author keywords available]

Indexed keywords

ALGAN LAYERS; ALGAN/GAN; ALGAN/GAN HIGH ELECTRON MOBILITY TRANSISTORS; CRITICAL VOLTAGES; DEFECT CONCENTRATIONS; DEGRADATION KINETICS; GATE CURRENT; GATE LEAKAGES; NEGATIVE CHARGE; PARASITIC LEAKAGES; PERCOLATION PROCESS; POSITIVE CHARGES; REVERSE-BIAS; STEP-STRESS; STRESS TIME; TIME-DEPENDENT;

EID: 84856501008     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3678041     Document Type: Article
Times cited : (116)

References (9)
  • 8
    • 0642306276 scopus 로고    scopus 로고
    • 10.1103/PhysRevB.55.4689
    • E. Calleja, Phys. Rev. B. 55 (7), 4689 (1997). 10.1103/PhysRevB.55.4689
    • (1997) Phys. Rev. B. , vol.55 , Issue.7 , pp. 4689
    • Calleja, E.1
  • 9
    • 0033319253 scopus 로고    scopus 로고
    • Degradation and breakdown in thin oxide layers: mechanisms, models and reliability prediction
    • DOI 10.1016/S0026-2714(99)00051-7
    • R. Degraeve, B. Kaczer, and G. Groeseneken, Microelectron. Reliab. 39, 1445 (1999). 10.1016/S0026-2714(99)00051-7 (Pubitemid 30524073)
    • (1999) Microelectronics Reliability , vol.39 , Issue.10 , pp. 1445-1460
    • Degraeve, R.1    Kaczer, B.2    Groeseneken, G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.