Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns

Nanoscale Research Letters

Volumn 6, Issue , 2011, Pages

  Barbagini, Francesca ^a   Bengoechea Encabo, Ana ^a   Albert, Steven ^a   Martinez, Javier ^a   García, Miguel Angel Sanchez ^a   Trampert, Achim ^b   Calleja, Enrique ^a  

^a UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

^b Paul Drude Institut für Festköperelektronik   (Germany)

Author keywords

Adhesion; Colloidal lithography; E beam lithography; Focused ion beam; Gan nanocolumns; Molecular beam epitaxy; Ordered growth; Roughness; Surface cleaning

Indexed keywords

ADHESION; ELECTRON BEAM LITHOGRAPHY; FOCUSED ION BEAMS; GALLIUM NITRIDE; III-V SEMICONDUCTORS; MOLECULAR BEAM EPITAXY; SURFACE CLEANING;

COLLOIDAL LITHOGRAPHY; COLUMNAR GROWTH; E-BEAM LITHOGRAPHY; GAN NANOCOLUMNS; NANOPATTERNING; ORDERED GROWTH; PATTERNING PROCESS; SELECTIVE GROWTH;

SURFACE ROUGHNESS;

EID: 84856051241     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-6-632     Document Type: Article

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