Hybrid FIB milling strategy for the fabrication of plasmonic nanostructures on semiconductor substrates

Nanoscale Research Letters

Volumn 6, Issue , 2011, Pages 1-5

  Einsle, Joshua F ^a   Bouillard, Jean Sebastien ^b   Dickson, Wayne ^b   Zayats, Anatoly V ^b  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

^b KING'S COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION VOLTAGES; ENERGY IONS; FIB MILLING; FOCUSED ION BEAM MILLING; HIGH SPATIAL RESOLUTION; PLASMONIC; PLASMONIC CRYSTALS; PLASMONIC NANOSTRUCTURES; SEMICONDUCTOR SUBSTRATE;

FABRICATION; ION BEAMS; IONS; LIGHT EMITTING DIODES; MILLING (MACHINING); OPTICAL PROPERTIES; PLASMONS; SEMICONDUCTOR LASERS; SUBSTRATES;

SEMICONDUCTOR DIODES;

EID: 84856029480     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-6-572     Document Type: Article

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