Radioactivity resistance evaluation of polymeric materials for application in radiopharmaceutical production at microscale

Microfluidics and Nanofluidics

Volumn 11, Issue 1, 2011, Pages 35-44

  Zacheo, A ^a   Arima, V ^a   Pascali, G ^b   Salvadori, P A ^b   Zizzari, A ^a   Perrone, E ^a   De Marco, L ^a   Gigli, G ^a   Rinaldi, R ^a  

^a NATIONAL NANOTECHNOLOGY LABORATORY   (Italy)

^b INSTITUTE OF CLINICAL PHYSIOLOGY   (Italy)

Author keywords

Microfabrication; Microfluidics; Positron emission tomography; Radiochemistry

Indexed keywords

ABSORPTION EFFECTS; HARD MATERIAL; HARD SUBSTRATE; HIGH YIELD; LAB-ON-CHIP; MICRO REACTOR; MICRO-SCALES; MICROFLUIDIC TECHNOLOGIES; POLYDIMETHYLSILOXANE PDMS; POSITRON EMISSION; POSITRON EMISSION TOMOGRAPHY RADIOPHARMACEUTICALS; RADIOCHEMISTRY; RADIOSYNTHESIS; SHORT REACTION TIME; TEFLON-LIKE COATINGS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL REACTORS; COATED MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARD COATINGS; MICROCHANNELS; MICROFABRICATION; MICROFLUIDICS; OPTICAL MICROSCOPY; POLYMERS; POLYTETRAFLUOROETHYLENES; POSITRONS; RADIATION; RADIOACTIVITY; RADIOGRAPHY; SILICONES;

POSITRON EMISSION TOMOGRAPHY;

EID: 84855963036     PISSN: 16134982     EISSN: 16134990     Source Type: Journal    
DOI: 10.1007/s10404-011-0770-0     Document Type: Article

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