X-ray photoelectron spectroscopic studies of black silicon for solar cell

Journal of Electron Spectroscopy and Related Phenomena

Volumn 184, Issue 11-12, 2012, Pages 589-592

  Xia, Yang ^a   Liu, Bangwu ^a   Zhong, Sihua ^a   Li, Chaobo ^a  

^a INSTITUTE OF MICROELECTRONICS   (China)

Author keywords

Black silicon; Formation mechanism; Microstructure; Plasma immersion ion implantation; X ray photoelectron spectroscopy

Indexed keywords

BLACK SILICON; ETCHING EFFECT; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; FORMATION MECHANISM; NEEDLE-LIKE; NEEDLE-LIKE STRUCTURE; OPTICAL REFLECTANCE; PLASMA IMMERSION ION IMPLANTATION; SPECTROSCOPIC STUDIES; SURFACE STATE; X-RAY PHOTOELECTRONS; XPS SPECTRA;

ELECTRONS; FLUORINE; ION BOMBARDMENT; ION IMPLANTATION; MICROSTRUCTURE; NEEDLES; PHOTONS; PLASMA APPLICATIONS; POROUS SILICON; REFLECTION; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON;

EID: 84855776198     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2011.10.004     Document Type: Article

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