Plasma texturing of multicrystalline silicon for solar cell using remote-type pin-to-plate dielectric barrier discharge

Journal of Physics D: Applied Physics

Volumn 42, Issue 21, 2009, Pages

  Yeom, Geun Young ^a,b,d   Park, Jae Beom ^a   Oh, Jong Sik ^e   Gil, Elly ^e   Kyoung, Se Jin ^b   Kim, Jung Sik ^c  

^a Sungkyunkwan University   (South Korea)

^b Sungkyunkwan University   (South Korea)

^c JUSUNG Eng Neungpyeong ri Opo eup   (South Korea)

^d National Program for Tera Level Devices   (South Korea)

^e NONE

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC BARRIER DISCHARGES; ETCH RATES; LOCAL SURFACES; MICROMASKING; MULTI-CRYSTALLINE SILICON; MULTICRYSTALLINE SILICON (MC-SI); PLATE-TYPE; VISIBLE WAVELENGTHS;

DIELECTRIC DEVICES; FLOW CONTROL; OXYGEN; PHOTORESISTS; PLASMAS; POLYSILICON; SURFACE ROUGHNESS; TEXTURING;

SURFACE MORPHOLOGY;

EID: 70450173692     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/21/215201     Document Type: Article

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