Two-dimensional microstructures induced by femtosecond vector light fields on silicon

Optics Express

Volumn 20, Issue 1, 2012, Pages 120-127

  Lou, Kai ^a   Qian, Sheng Xia ^a   Wang, Xi Lin ^a   Li, Yongnan ^a   Gu, Bing ^a   Tu, Chenghou ^a   Wang, Hui Tian ^a,b  

^a NANKAI UNIVERSITY   (China)

^b NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; POLARIZATION; TWO DIMENSIONAL;

FEMTOSECONDS; LIGHT FIELDS; LINEAR POLARIZATION; PULSE FLUENCE; SPATIAL STRUCTURE;

MICROSTRUCTURE;

SILICON;

ARTICLE; CHEMISTRY; LIGHT; MATERIALS TESTING; METHODOLOGY; RADIATION DOSE; RADIATION EXPOSURE; REFRACTOMETRY; SURFACE PROPERTY;

LIGHT; MATERIALS TESTING; RADIATION DOSAGE; REFRACTOMETRY; SILICON; SURFACE PROPERTIES;

EID: 84855464756     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.000120     Document Type: Article

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