Efficiency of silicon micromachining by femtosecond laser pulses in ambient air

Journal of Applied Physics

Volumn 99, Issue 8, 2006, Pages

  Hwang, David J ^a   Grigoropoulos, Costas P ^a   Choi, Tae Y ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT AIR; FEMTOSECOND LASER PULSES; SILICON MICROMACHINING;

ABSORPTION; AIR; LASER ABLATION; LASER PULSES; PHOTONS; SAPPHIRE; SILICON;

MICROMACHINING;

EID: 33646743149     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2187196     Document Type: Article

References (27)

1. X. Liu, D. Du, and G. Mourou, IEEE J. Quantum Electron. 33, 1706 (1997).
2. F. Korte, S. Nolte, B. N. Chichkov, T. Bauer, G. Kamlage, T. Wagner, C. Fallnich, and H. Welling, Appl. Phys. A: Mater. Sci. Process. 69, S7 (1999).
3. D. J. Hwang, T. Choi, and C. P. Grigoropoulos, Appl. Phys. A: Mater. Sci. Process. 79, 605 (2004).
4. C. B. Schaffer, A. Brodeur, J. F. García, and E. Mazur, Opt. Lett. 26, 93 (2001).
5. B. K. A. Ngoi, K. Venkatakrishnan, E. N. L. Lim, B. Tan, and L. H. K. Koh, Opt. Lasers Eng. 35, 361 (2001).
6. P. P. Pronko, S. K. Dutta, J. Squier, J. V. Rudd, D. Du, and G. Mourou, Opt. Commun. 114, 106 (1995).
7. M. Li and X. Liu, Jpn. J. Appl. Phys., Part 1 40, 3476 (2001).
8. P. Simon and J. Ihlemann, Appl. Surf. Sci. 109/110, 25 (1997).
9. F. Korte, Opt. Express 7, 41 (2000).
10. C. Momma, S. Nolte, B. N. Chichkov, F. V. Alvensleben, and A. Tunnermann, Appl. Surf. Sci. 109/110, 15 (1997).
11. K. Furusawa, K. Takahashi, H. Kumagai, K. Midorikawa, and M. Obara, Appl. Phys. A: Mater. Sci. Process. 69, S359 (1999).
12. S. Besner, J. Y. Degorce, A. V. Kabashin, and M. Meunier, Appl. Surf. Sci. 247, 163 (2005).
13. S. Nolte, C. Momma, H. Jacobs, A. Tunnermann, B. N. Chichkov, B. Wellegehausen, and H. Welling, J. Opt. Soc. Am. B 14, 2716 (1997).
14. M. Ye, Ph.D. dissertation, University of California, Berkeley, 2000; M. Ye and C. P. Grigoropoulos, J. Appl. Phys. 89, 5183 (2001).
15. M. Ye, Ph.D. dissertation, University of California, Berkeley, 2000; M. Ye and C. P. Grigoropoulos, J. Appl. Phys. 89, 5183 (2001).
16. K. Sokolowski-Tinten and D. V. D. Linde, Phys. Rev. B 61, 2643 (2000).
17. H. M. Van Driel, Phys. Rev. B 35, 8166 (1987).
18. E. Palik, Handbook of Optical Constants of Solids (Academic, New York, 1985).
19. T. Y. Choi and C. P. Grigoropoulos, J. Appl. Phys. 92, 4918 (2002).
20. J. Sun and J. P. Longtin, J. Appl. Phys. 89, 8219 (2001).
21. T. Schwarz-Selinger, D. G. Cahill, S. C. Chen, S. J. Moon, and C. P. Grigoropoulos, Phys. Rev. B 64, 155323 (2001).
22. S. S. Mao, X. Mao, R. Greif, and R. E. Russo, Appl. Phys. Lett. 76, 31 (2000).
23. Z. Wu, H. Jiang, L. Luo, H. Guo, H. Yang, and Q. Gong, Opt. Lett. 27, 448 (2002).
24. A. Zhidkov, A. Sasaki, T. Utsumi, and I. Fukumoto, Phys. Rev. E 62, 7232 (2000).
25. J. Steingruber, S. Borgstrom, T. Starczewski, and U. Litzen, J. Phys. B 29, L75 (1996).
26. L. A. Gizzi, D. Giulietti, A. Giulietti, P. Audebert, S. Bastiani, J. P. Geindre, and A. Mysyrovicz, Phys. Rev. Lett. 76, 2278 (1996).
27. D. Bäuerle, Laser Processing and Chemistry, 2nd ed. (Springer, Berlin, 1996).