Porous inorganic-organic hybrid material by oxygen plasma treatment

Journal of Micromechanics and Microengineering

Volumn 21, Issue 12, 2011, Pages

  Aura, Susanna ^a   Jokinen, Ville ^a   Laitinen, Mikko ^b   Sajavaara, Timo ^b   Franssila, Sami ^a  

^a AALTO UNIVERSITY   (Finland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

AREA SELECTIVE; ATOMIC LAYER; DIFFERENT PORE SIZES; ELASTIC RECOIL DETECTION ANALYSIS; ETCH MASK; ETCHING PARAMETERS; HYBRID FILM; INORGANIC-ORGANIC HYBRID MATERIALS; MICRO AND NANOSTRUCTURES; ORMOCER; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; PLANAR FILMS; PLASMA PROCESS; PORE FORMATION; RUTHERFORD BACK-SCATTERING SPECTROMETRY; THIN-FILM DEPOSITIONS; TIME OF FLIGHT; TOTAL REFLECTANCE;

CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; DEPOSITION; FLUIDICS; HYBRID MATERIALS; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; PORE SIZE; POROUS MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS;

REACTIVE ION ETCHING;

EID: 84855417095     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/12/125003     Document Type: Article

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