Etch-free selective area growth of well-aligned ZnO nanorod arrays by economical polymer mask for large-area solar cell applications

Solar Energy Materials and Solar Cells

Volumn 98, Issue , 2012, Pages 476-481

  Ahsanulhaq, Qurashi ^a,b   Kim, Jin Hwan ^a   Hahn, Yoon Bong ^a  

^a Chonbuk National University   (South Korea)

^b KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS   (Saudi Arabia)

Author keywords

Etch free patterning; Photopolymer mask; Structural and optical properties; ZnO nanorods

Indexed keywords

AVERAGE DIAMETER; C-AXIS DIRECTION; CONVENTIONAL PHOTOLITHOGRAPHY; COST-EFFECTIVE SOLUTIONS; DEEP LEVEL; DRY ETCHING PROCESS; ETCH-FREE PATTERNING; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; LARGE-AREA SOLAR CELLS; LIGHT-TRAPPING; LOW COSTS; MICROPATTERNS; PATTERNED SUBSTRATES; PATTERNING PROCESS; PHOTOLUMINESCENCE SPECTRUM; POLYMER MASKS; SELECTIVE AREA GROWTH; SINGLE-CRYSTALLINE; STRUCTURAL AND OPTICAL PROPERTIES; SURFACE TRAPPING; ULTRAVIOLET EMISSION; VISIBLE EMISSIONS; WELL-ALIGNED; ZNO; ZNO NANOROD; ZNO NANOROD ARRAYS;

FIELD EMISSION MICROSCOPES; OPTICAL PROPERTIES; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; ZINC OXIDE;

NANORODS;

EID: 84855331751     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2011.11.002     Document Type: Article

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