Oxidation of Zn in UHV environment at low temperature

Applied Surface Science

Volumn 258, Issue 6, 2012, Pages 1955-1957

  Noothongkaew, Suttinart ^a,b   Nakajima, Hideki ^b,c   Tong On, Anusorn ^a,b   Meevasana, Worawat ^a,b,c   Songsiriritthigul, Prayoon ^a,b,c  

^a SURANAREE UNIVERSITY OF TECHNOLOGY   (Thailand)

^b SYNCHROTRON LIGHT RESEARCH INSTITUTE   (Thailand)

^c Thailand Ministry of Science and Technology   (Thailand)

Author keywords

Oxidation of Zn; Photoemission spectroscopy; Synchrotron radiation; ZnO

Indexed keywords

II-VI SEMICONDUCTORS; PHOTOELECTRON SPECTROSCOPY; SYNCHROTRON RADIATION; SYNCHROTRONS; TEMPERATURE; THERMOOXIDATION; ZINC OXIDE;

INITIAL OXIDATION; LOGARITHMIC EQUATIONS; LOW TEMPERATURES; OXIDATION OF ZN; OXIDATION PROCESS; OXIDATION TEMPERATURE; SYNCHROTRON LIGHT; THERMAL OXIDATION;

ZINC;

EID: 84855277868     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.06.071     Document Type: Article

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