High-efficiency microcrystalline silicon and microcrystalline silicon-germanium alloy solar cells

Materials Research Society Symposium Proceedings

Volumn 1321, Issue , 2012, Pages 21-32

  Matsui, Takuya ^a   Kondo, Michio ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHIC ORIENTATIONS; DESIGN CRITERION; DEVICE PERFORMANCE; GE CONTENT; GRAIN SIZE; HIGH DEPOSITION RATES; HYDROGENATED MICROCRYSTALLINE SILICON; INFRARED RESPONSE; NATIVE DEFECT; OXYGEN DOPING; P-I-N JUNCTIONS; SILICON-GERMANIUM ALLOYS; SOLAR CELL PARAMETERS;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; CERIUM ALLOYS; CHEMICAL VAPOR DEPOSITION; DANGLING BONDS; GERMANIUM; GERMANIUM ALLOYS; GRAIN BOUNDARIES; MICROCRYSTALLINE SILICON; NANOSTRUCTURED MATERIALS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR DOPING; SILICON ALLOYS;

AMORPHOUS SILICON;

EID: 84455183852     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/opl.2011.1149     Document Type: Conference Paper

References (25)

1. J. Meier, S. Dubail, R. Flückiger, H. Keppner and A. Shah, Appl. Phys. Lett. 65, 860 (1994).
2. K. Yamamoto, IEEE Trans. Electron Devices 46, 2041 (1999).
3. K. Saito, M. Sano, A. Sakai, R. Hayashi and K. Ogawa, Tech. Dig. 20th Int. PVSEC, Jeju, Korea (2001) p. 429.
4. Y. Nasuno, M. Kondo and A. Matsuda, Jpn. J. Appl. Phys. 41, 5912 (2002).
5. O. Vetterl, R. Carius, L. Houben, C. Scholten, M. Luysberg, A. Lambertz, F. Finger and H. Wagner, Mater. Res. Soc. Symp. Proc. 609, A15.2.1 (2000).
6. M. Kondo, M. Fukawa, L. Guo and A. Matsuda, J. Non-Cryst. Solids 266-269, 84 (2000).
7. F. Finger, U. Kroll, V. Viret, A. Shah, W. Beyer, X. -M. Tang, J. Weber, A. Howling and Ch. Hollenstein, J. Appl. Phys. 71, 5665 (1992).
8. T. Matsui, M. Kondo and A. Matsuda, Jpn. J. Appl. Phys. 42, L901 (2002).
9. J. Bailat, L. Fesquet, J-B. Orhan, Y. Djeridane, B. Wolf, P. Madliger, J. Steinhauser, S. Benagli, D. Borrello, L. Castens, G. Monteduro, M. Marmelo, B. Dehbozorghi, E. Vallat-Sauvain, X. Multone, D. Romang, J-F. Boucher, J. Meier, U. Kroll,M. Despeisse, G. Bugnon, C. Ballif S. Marjanovic, G. Kohnke, N. Borrelli, K. Koch, J. Liu, R. Modavis, D. Thelen, S. Vallon, A. Zakharian and D. Weidman, Proc. of 5th WCPEC, Valencia, Spain (2010) p. 2720.
10. G. Ganguly, T. Ikeda, T. Nishimiya, K. Saitoh, M. Kondo and A. Matsuda, Appl. Phys. Lett. 69, 4224 (1996).
11. R. Carius, J. Fölsch, D. Lundszien, L. Houben and F. Finger, Mater. Res. Soc. Symp. Proc. 507, 813 (1998).
12. M. Isomura, K. Nakahata, M. Shima, S. Taira, K. Wakisaka, M. Tanaka and S. Kiyama, Sol. Energy Mater. & Sol. Cells 74, 519 (2002).
13. T. Matsui, T. Takada, C. W. Chang, M. Isomura, H. Fujiwara and M. Kondo, Appl. Phys. Express 1, 031501 (2008).
14. T. Matsui, H. Jia and M. Kondo, Prog. Photovolt: Res. Appl. 18, 48 (2010).
15. T. Matsui, H. Jia, M. Kondo, K. Mizuno, S. Tsuruga, S. Sakai and Y. Takeuchi, Proc. of 35th IEEE-PVSC, Hawaii, (2010) p. 000311.
16. T. Matsui, C.W. Chang, M. Kondo, K. Ogata and M. Isomura, Appl. Phys. Lett. 91, 102111 (2007).
17. P. Torres, J. Meier, R. Flückiger, U. Kroll, J. A. Anna Selvan, H. Keppner, A. Shah, S. D. Littlewood, I. E. Kelly and P. Giannoulès, Appl. Phys. Lett. 69, 1373 (1996).
18. A.H.M. Smets, T. Matsui and M. Kondo, Appl. Phys. Lett. 92, 033506 (2008).
19. S. Vepřek, Z. Iqbal, R. O. Kühne, P. Capezzuto, F-A. Sarott and J. K. Gimzewski, J. Phys. C: Solid State Phys. 16, 6241 (1983).
20. T. Matsui, M. Tsukiji, H. Saika, T. Toyama and H. Okamoto, Jpn. J. Appl. Phys. 41, 20 (2002).
21. R. Braunstein, A. R. Moore, and F. Herman, Phys. Rev. 109, 695 (1958).
22. C.W. Chang, T. Matsui and M. Kondo, J. Non-Cryst. Solids 354, 2365 (2008).
23. Y. Yashiki, S. Miyajima, A. Yamada and M. Konagai, Jpn J. Appl. Phys. 46, 2865 (2007).
24. S. Margalit, A. Bar-Lev, A. B. Kuper, H. Aharoni and A. Neugroschel, J. Cryst. Growth 17, 288 (1972).
25. T. Kilper, W. Beyer, G. Bräuer, T. Bronger, R. Carius, M. N. van den Donker, D. Hrunski, A. Lambertz, T. Merdzhanova, A. Mück, B. Rech, W. Reetz, R. Schmitz, U. Zastrow and A. Gordijn, J. Appl. Phys. 105, 074509 (2009).