Electron spin resonance study of hydrogenated microcrystalline silicon-germanium alloy thin films

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2365-2368

  Chang, C W ^a,b,c   Matsui, T ^a   Kondo, M ^a,c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Conductivity; Electron spin resonance; Germanium; Photoconductivity; Photovoltaics; Silicon

Indexed keywords

AMORPHOUS SILICON; MICROCRYSTALLINE SILICON; PARAMAGNETIC RESONANCE; PHOTOCONDUCTIVITY; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON ALLOYS;

DANGLING BOND DEFECTS;

THIN FILMS;

EID: 43049106521     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.09.022     Document Type: Article

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