Low temperature growth mechanisms of vertically aligned carbon nanofibers and nanotubes by radio frequency-plasma enhanced chemical vapor deposition

Carbon

Volumn 50, Issue 3, 2012, Pages 1235-1242

  Wang, Huiyao ^a   Moore, John J ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PARAMETERS; FENI FILMS; GLASS SUBSTRATES; LOW TEMPERATURE GROWTH; LOW TEMPERATURES; NANO-CATALYST; NI CATALYSTS; NI FILMS; NI THIN FILMS; PLASMA PHYSICS; RF-PECVD; SI SUBSTRATES; SUBSTRATE CHARACTERISTICS; SYNTHESIS TEMPERATURES; THERMAL CVD; TIP GROWTH; TURBOSTRATIC; VERTICALLY ALIGNED CARBON NANOFIBERS;

CARBON NANOFIBERS; CATALYSTS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GLASS; HYDROGEN; MULTIWALLED CARBON NANOTUBES (MWCN); PLASMA DEPOSITION; PLASMAS; RADIO; RADIO WAVES; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 84155164940     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2011.10.041     Document Type: Article

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