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Electrochemical and Solid-State Letters

Volumn 7, Issue 10, 2004, Pages

Novel interpretations of CMP removal rate dependencies on slurry particle size and concentration

(3) Tamboli, D a Banerjee, G a Waddell, M a

a Air Products and Chemicals (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONDENSATION; HYDROTHERMAL SYNTHESIS; MATHEMATICAL MODELS; PARTICLE SIZE ANALYSIS; PRECIPITATION (CHEMICAL); REACTION KINETICS; SOL-GELS; THIN FILMS;

CHEMICAL VAPOR CONDENSATION (CVC); HEAT GENERATION; HYDROTHERMAL PROCESSING; MATERIAL REMOVAL;

CHEMICAL MECHANICAL POLISHING;

EID: 8344250968 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.1795033 Document Type: Article

Times cited : (41)

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