Twin formation in sputter-grown ZnO/Al2O3(0001) epitaxial film: A real time x-ray scattering study

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 5, 2004, Pages 2159-2162

  Kim, I W ^a   Kwon, Y B ^a   Yl, J M ^a   Je, J H ^a   Nouet, G ^b   Wojtowicz, T ^b   Ruterana, P ^b   Kioseoglou, J ^c  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b CNRS   (France)

^c ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; EPITAXIAL GROWTH; FILM GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; RELAXATION OSCILLATORS; SPUTTER DEPOSITION; SYNCHROTRONS; THICKNESS CONTROL; X RAY ANALYSIS;

CRITICAL THICKNESS; CRYSTALLINE PERFECTION; TWIN FORMATION MECHANISM; X-RAY SCATTERING;

ZINC OXIDE;

EID: 8344232294     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1778407     Document Type: Article

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