SCOPUS 정보 검색 플랫폼

Journal of Analytical Atomic Spectrometry

Volumn 26, Issue 10, 2011, Pages 1986-1989

Pushing the limits for fast spatially resolved elemental distribution patterns

(9) Kühn, Andreas a Scharf, Oliver b,c Ordavo, Ivan d Riesemeier, Heinrich a Reinholz, Uwe a Radtke, Martin a Berger, Achim a Ostermann, Markus a Panne, Ulrich a,e

a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING (Germany)

b LEIBNIZ INSTITUT FÜR KATALYSE E V AN DER UNIVERSITÄT ROSTOCK (Germany)

c IFG Institute of Scientific Instruments GmbH (Germany)

d PNSENSOR GMBH (Germany)

e HUMBOLDT UNIVERSITY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE AREA; CHIP TEMPERATURE; ELEMENTAL DISTRIBUTION; POLYCAPILLARY OPTICS; REQUIRED TIME; SPATIAL RESOLUTION; SPATIALLY RESOLVED; TOTAL REFLECTION; TOTAL REFLECTION X-RAY FLUORESCENCE; TRACE AMOUNTS; X RAY FLUORESCENCE; X RAY SPECTRUM;

ELECTROMAGNETIC WAVE REFLECTION; FLUORESCENCE; PIXELS; X RAY CAMERAS;

X RAYS;

EID: 82755182323 PISSN: 02679477 EISSN: 13645544 Source Type: Journal
DOI: 10.1039/c1ja10069f Document Type: Article

Times cited : (17)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.