Effect of thin film confined between two dissimilar solids on interfacial thermal resistance

Journal of Physics Condensed Matter

Volumn 23, Issue 49, 2011, Pages

  Liang, Zhi ^a   Tsai, Hai Lung ^a  

^a University of Missouri Rolla   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSIMILAR SOLIDS; INTERFACIAL THERMAL RESISTANCE; MATERIAL INTERFACES; NONEQUILIBRIUM MOLECULAR DYNAMICS; PHONON DENSITY OF STATE; PHONON FREQUENCIES; SOLID-SOLID INTERFACES; THERMAL TRANSPORT;

ATOMS; MOLECULAR DYNAMICS; PHONONS; THICK FILMS; THIN FILMS;

INTERFACES (MATERIALS);

ARTICLE; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; ELECTRON; MATERIALS TESTING; PHOTON; SURFACE PROPERTY; THEORETICAL MODEL; THERMAL CONDUCTIVITY; THERMODYNAMICS;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; ELECTRONS; MATERIALS TESTING; MODELS, THEORETICAL; PHOTONS; SURFACE PROPERTIES; THERMAL CONDUCTIVITY; THERMODYNAMICS;

EID: 82455178967     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/23/49/495303     Document Type: Article

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