A process planning method for thin film mask projection micro-stereolithography

Proceedings of the ASME Design Engineering Technical Conference

Volumn 2, Issue PARTS A AND B, 2009, Pages 685-694

  Jariwala, Amit S ^a   Ding, Fei ^a   Zhao, Xiayun ^a   Rosen, David W ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC MASKS; INCIDENT RADIATION; MASK PROJECTION; PHOTOPOLYMER RESINS; PROCESS PLAN; RADIATION TRANSMISSION; RECOATING; REDUCING PROCESS; REGRESSION MODEL; SUBSTRATE SURFACE; TRANSPARENT SUBSTRATE;

COMPUTER SCIENCE; CURING; DESIGN; PROCESS PLANNING; REGRESSION ANALYSIS; STEREOLITHOGRAPHY;

SUBSTRATES;

EID: 82155164110     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/DETC2009-87532     Document Type: Conference Paper

References (14)

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