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Volumn , Issue , 2008, Pages 216-229

A film fabrication process on transparent substrate using mask projection micro-stereolithography

Author keywords

[No Author keywords available]

Indexed keywords

CURING; OPTICAL SYSTEMS; RESINS; SUBSTRATES;

EID: 77953772142     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (11)

References (14)
  • 1
    • 0002358952 scopus 로고    scopus 로고
    • Microstereolithography using liquid crystal display as dynamic mask-generator
    • Bertsch A., Zissi S., Jezequel J., Corbel S., Andre J. (1997) "Microstereolithography using liquid crystal display as dynamic mask-generator", Microsystems Technologies, Vol 3 No 2, pp. 42-47.
    • (1997) Microsystems Technologies , vol.3 , Issue.2 , pp. 42-47
    • Bertsch, A.1    Zissi, S.2    Jezequel, J.3    Corbel, S.4    Andre, J.5
  • 2
  • 7
    • 0003222210 scopus 로고
    • Rapid prototyping and manufacturing: Fundamentals of stereolithography
    • Jacobs, P. 1992. Rapid Prototyping and Manufacturing: Fundamentals of StereoLithography. Society of Manufacturing Engineers.
    • (1992) Society of Manufacturing Engineers
    • Jacobs, P.1
  • 9
    • 34047173201 scopus 로고    scopus 로고
    • Process planning method for mask projection microstereolithography
    • Limaye, A and Rosen, D 2007. Process planning method for mask projection microstereolithography, Rapid Prototyping Journal 13(2): 76-84
    • (2007) Rapid Prototyping Journal , vol.13 , Issue.2 , pp. 76-84
    • Limaye, A.1    Rosen, D.2
  • 10
    • 0037021771 scopus 로고    scopus 로고
    • A novel microchip for capillary electrophoresis with acrylic microchannel fabricated on photosensor array
    • Mizukami Y., Rajnaik D., Rajnaik A., Nishimura M. (2002) "A novel microchip for capillary electrophoresis with acrylic microchannel fabricated on photosensor array", Sensors and Actuators B, Vol. 81, pp. 202-209.
    • (2002) Sensors and Actuators B , vol.81 , pp. 202-209
    • Mizukami, Y.1    Rajnaik, D.2    Rajnaik, A.3    Nishimura, M.4
  • 11
    • 0032665199 scopus 로고    scopus 로고
    • Microstereolithography using dynamic mask generator and a non-coherent visible light source
    • Monneret S., Loubere V., Corbel S., (1999) "Microstereolithography using dynamic mask generator and a non-coherent visible light source", Proc. SPIE, Vol 3680, pp. 553-561.
    • (1999) Proc. SPIE , vol.3680 , pp. 553-561
    • Monneret, S.1    Loubere, V.2    Corbel, S.3
  • 12
    • 49149086609 scopus 로고    scopus 로고
    • Use of parameter estimation for stereolithography surface finish improvement
    • Sager, B.,and D. W. Rosen (2008). "Use of Parameter Estimation for Stereolithography Surface Finish Improvement." Rapid Prototyping Journal Vol 14, 213-220.
    • (2008) Rapid Prototyping Journal , vol.14 , pp. 213-220
    • Sager, B.1    Rosen, D.W.2
  • 13
    • 21744443864 scopus 로고    scopus 로고
    • Projection micro-stereolithography using digital micro-mirror dynamic mask
    • Sun C., Fang N., Wu D.M., Zhang X., (2005) "Projection micro-stereolithography using digital micro-mirror dynamic mask", Sensors and Actuators A, Vol. 121, pp. 113-120.
    • (2005) Sensors and Actuators A , vol.121 , pp. 113-120
    • Sun, C.1    Fang, N.2    Wu, D.M.3    Zhang, X.4
  • 14
    • 84898431381 scopus 로고    scopus 로고
    • th July, 2008
    • Referred website: http://www.envisiontec.de; visited on 7th July, 2008.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.