MOEMS-based lithography for the fabrication of micro-optical components

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 4, 2005, Pages

  Erdmann, Lars ^a   Deparnay, Arnaud ^a   Maschke, Gunter ^a   Längle, Mario ^a   Brunner, Robert ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

Lithography; MEMS; Micro optics; MOEMS

Indexed keywords

DIGITAL DEVICES; IMAGE ANALYSIS; LITHOGRAPHY; MICROOPTICS; MICROSTRUCTURE; PHOTOCONDUCTING DEVICES; REFRACTIVE INDEX;

DIGITAL-MULTIMIRROR DEVICE (DMD); MICRO-OPTICAL COMPONENTS; MOEMS-BASED LITHOGRAPHY; PHOTORESIST LAYERS;

MICROELECTROMECHANICAL DEVICES;

EID: 33747592117     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2114647     Document Type: Article

References (5)

1. J. Yao, J. Su, J. Du, Y. Zhang, F. Gao, F. Gao, Y. Guo, and Z. Cui, "Coding gray-tone mask for refractive microlens fabrication," Micro electron. Eng. 53, 531-534 (2000).
2. D. J. D. Carter, D. Gil, R. Menon, M. K. Mondol, H. I. Smith, and E. H. Anderson, "Maskless parallel patterning with zone-plate array lithography," J. Vac. Sci. Technol. B 17(6), 3449-3452 (1999).
3. T. R. M. Sales, "Beam shaping and homogenization with random microlens arrays," Diffractive Optics Micro-Optics, pp. 8-10 (2002).
4. T. R. M. Sales, "Structured microlens arrays for beam shaping," Opt. Eng. 42(11), 3084-3085 (2003).
5. F. M. Dickey and S. C. Holswade, Laser Beam Shaping - Theory and Techniques, pp. 284-288, Marcel Dekker, Inc., New York (2000).