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Volumn 21, Issue 38, 2011, Pages 14936-14940

Fabrication of a hierarchical structure by oxygen plasma etching of a photocured microstructure containing a silicon moiety

(4) Choi, Se Jin a Choi, Moon Kee b Tahk, Dongha a,b Yoon, Hyunsik b

a RandD Center (South Korea)

b Seoul National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BIOMIMETICS; HYDROPHOBICITY; MICROSTRUCTURE; MONOMERS; NANOTECHNOLOGY; PLASMA ETCHING; SELF ASSEMBLED MONOLAYERS; SILICONES;

FABRICATION METHOD; FUNCTIONALIZED; HIERARCHICAL STRUCTURES; NANO-SCALE ROUGHNESS; OXYGEN PLASMA ETCHING; OXYGEN PLASMAS; PHOTOCURABLE; PHOTOCURING; PREPOLYMERS; STRAIGHT-FORWARD METHOD; SUPER-HYDROPHOBIC SURFACES; WEIGHT RATIOS;

OXYGEN;

EID: 81855226568 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c1jm12305j Document Type: Article

Times cited : (10)

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