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Volumn 520, Issue 3, 2011, Pages 913-917
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X-ray photoelectron spectroscopy and thermal desorption spectroscopy comparative studies of L-CVD SnO2 ultra thin films
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Author keywords
Depth profiling (DP); L CVD ultrathin films; Surface chemistry; Thermal desorption spectroscopy (TDS); Tin dioxide; X ray protoelectron spectroscopy (XPS)
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Indexed keywords
AIR EXPOSURE;
ATOMIC OXYGEN;
COMPARATIVE STUDIES;
GOOD CORRELATIONS;
IN-SITU HYDROGENATION;
MOLECULAR HYDROGEN;
NON-STOICHIOMETRY;
NONSTOICHIOMETRIC;
RELATIVE CONCENTRATION;
SI (100) SUBSTRATE;
ULTRA-THIN;
X RAY PHOTOEMISSION SPECTROSCOPY;
X-RAY PROTOELECTRON SPECTROSCOPY (XPS);
CARBON DIOXIDE;
CHEMICAL STABILITY;
CHEMICAL VAPOR DEPOSITION;
DEPTH PROFILING;
HYDROGEN;
HYDROGENATION;
MOLECULAR OXYGEN;
MONOLAYERS;
PHOTOELECTRON SPECTROSCOPY;
SURFACE CHEMISTRY;
THERMAL DESORPTION;
THERMAL DESORPTION SPECTROSCOPY;
TIN;
TIN DIOXIDE;
ULTRATHIN FILMS;
WATER VAPOR;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 81855222093
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.04.185 Document Type: Conference Paper |
Times cited : (26)
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References (29)
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