Comparative XPS and PYS studies of SnO2 thin films prepared by L-CVD technique and exposed to oxygen and hydrogen

Sensors and Actuators, B: Chemical

Volumn 70, Issue 1-3, 2000, Pages 177-181

  Szuber, J ^a   Czempik, G ^a   Larciprete, R ^b   Adamowicz, B ^a  

^a SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

^b ENEA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; FERMI LEVEL; HYDROGEN; OXYGEN; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

LASER INDUCED CHEMICAL VAPOUR DEPOSITION; PHOTOEMISSION YIELD SPECTROSCOPY;

TIN COMPOUNDS;

EID: 0034322729     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(00)00564-5     Document Type: Article

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