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Volumn 8166, Issue , 2011, Pages
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High resolution mask process and substrate for 20 nm and early 14 nm node lithography
a b a a b b b b b a c c c c
a
IBM
(United States)
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Author keywords
Bright field masks; Chrome hard mask; Clear field masks; E beam resist; Mask inspection; Photomask cleaning; Photomask materials; Photomask substrates; Thin OMOG
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Indexed keywords
E-BEAM RESIST;
HARD MASKS;
MASK INSPECTION;
PHOTOMASK CLEANING;
PHOTOMASK SUBSTRATES;
THIN OMOG;
CHARACTERIZATION;
CLEANING;
NANOTECHNOLOGY;
OPTIMIZATION;
PHOTOMASKS;
PHOTORESISTS;
SUBSTRATES;
LITHOGRAPHY;
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EID: 81455148979
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.898889 Document Type: Conference Paper |
Times cited : (4)
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References (5)
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