Development and characterization of a thinner binary mask absorber for 22 nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7823, Issue PART 1, 2010, Pages

  Faure, Tom ^a   Badger, Karen ^a   Kindt, Louis ^a   Kodera, Yutaka ^b   Komizo, Toru ^b   Kondo, Shinpei ^c   Mizoguchi, Takashi ^c   Nemoto, Satoru ^c   Seki, Kazunori ^c   Senna, Tasuku ^c   Wistrom, Richard ^a   Zweber, Amy ^a   Nishikawa, Kazuhiro ^d   Inazuki, Yukio ^d   Yoshikawa, Hiroki ^d  

^a IBM   (United States)

^b TOPPAN PRINTING CO LTD   (Japan)

^c Toppan Photomasks Inc   (United States)

^d SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

22 nm masks; Binary photomask; EMF effect; Mask blank; OMOG

Indexed keywords

22 NM MASKS; BINARY PHOTOMASK; EMF EFFECT; MASK BLANK; OMOG;

ELECTROMAGNETIC FIELD EFFECTS; ELECTROMAGNETIC FIELDS; LITHOGRAPHY; NANOTECHNOLOGY; SUBSTRATES;

PHOTOMASKS;

EID: 78649822092     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.864130     Document Type: Conference Paper

References (4)

1. Jaione Tirapu-Azpiroz et al., "Understanding the Trade-offs of Thinner Binary Mask Absorbers," Submitted to SPIE Photomask Technology Conference, (2010).
2. S. Nash and T. Faure, "X-ray mask process-induced distortion study", Journal of Vacuum Science and Technology B, Vol. 9, pp. 3324-3328, (1991).
3. Satoru Nemoto, Thomas Faure, Richard Wistrom, Shaun Crawford, Gary Reid, Peter Bartlau, Toru Komizo and Amy E. Zweber "Etch Characterization of Binary Mask Dependence on Mask Material and Resist Thickness for 22 nm Mask Fabrication", Proc. SPIE, 7379, 737907, (2009)
4. Thomas Faure, Emily Gallagher, Michael Hibbs, Louis Kindt, Ken Racette, Richard Wistrom, Amy Zweber, Alfred Wagner, Yasutaka Kikuchi, Toru Komizo and Satoru Nemoto, "Characterization of Binary and Attenuated Phase Shift Mask Blanks for 32nm Mask Fabrication", Proc. SPIE, Vol. 7122, 712209, (2008)