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Volumn , Issue , 2011, Pages 118-120

Process development of multi-layer stacked chip module

Author keywords

[No Author keywords available]

Indexed keywords

BONDING PROCESS; MICRO-BUMPS; MULTIPLE LAYERS; PROCESS DEVELOPMENT;

EID: 81355142665     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICEPT.2011.6066802     Document Type: Conference Paper
Times cited : (5)

References (10)
  • 2
    • 79951860992 scopus 로고    scopus 로고
    • Evolution and outlook of TSV and 3D IC/Si integration
    • Singapore, Dec.
    • J. H. Lau, "Evolution and outlook of TSV and 3D IC/Si integration," 12th Electronics Packaging Technology Conference (EPTC), Singapore, Dec.2010, pp.560-570.
    • (2010) 12th Electronics Packaging Technology Conference (EPTC) , pp. 560-570
    • Lau, J.H.1
  • 4
    • 62249169291 scopus 로고    scopus 로고
    • Copper electrodeposition for 3D integration
    • Nice, April
    • Rozalia Beica, Charles Sharbono, Tom Ritzdorf, "Copper Electrodeposition for 3D Integration," DTIP of MEMS & MOMEM, Nice, April, 2008, pp.127-131.
    • (2008) DTIP of MEMS & MOMEM , pp. 127-131
    • Beica, R.1    Sharbono, C.2    Ritzdorf, T.3
  • 5
    • 54249125500 scopus 로고    scopus 로고
    • Filling of very fine via holes for three dimensional packaging by using ionized metal plasma sputtering and electroplating
    • Byeong-Hoon Cho, Jae-Jin Yun, and Won-Jong Lee, "Filling of very fine via holes for three dimensional packaging by using ionized metal plasma sputtering and electroplating," Jpn. J. Appl Phys. 46 (2007) pp. L1135-L1137.
    • (2007) Jpn. J. Appl Phys. , vol.46
    • Cho, B.-H.1    Yun, J.-J.2    Lee, W.-J.3
  • 8
    • 70349665789 scopus 로고    scopus 로고
    • TSV metallization: A novel approach for insulation/barrier/copper seed layer deposition basedon wet electrografting and chemical grafting technologies
    • Boston, MA, Dec.
    • Suhr, D. et al., "TSV metallization: a novel approach for insulation/barrier/copper seed layer deposition basedon wet electrografting and chemical grafting technologies," Proc. MRS Fall Conf, Boston, MA, Dec. 2008, pp. 247-255.
    • (2008) Proc. MRS Fall Conf , pp. 247-255
    • Suhr, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.