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1
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61649110276
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Threedimensional silicon integration
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J. U. Knickerbocker, P. S. Andry, B. Dang, R. R. Horton, M. J. Interrante, C. S. Patel, R. J. Polastre, K. Sakuma, R. Sirdeshmukh, E. J. Sprogis, S. M. Sri-Jayantha, A. M. Stephens, A. W. Topol, C. K. Tsang, B. C. Webb, S. L. Wright, "Threedimensional silicon integration," IBM J. RES. & DEV., VOL. 52, NO. 6 (2008), pp. 553-569.
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IBM J. Res. & Dev.
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Knickerbocker, J.U.1
Andry, P.S.2
Dang, B.3
Horton, R.R.4
Interrante, M.J.5
Patel, C.S.6
Polastre, R.J.7
Sakuma, K.8
Sirdeshmukh, R.9
Sprogis, E.J.10
Sri-Jayantha, S.M.11
Stephens, A.M.12
Topol, A.W.13
Tsang, C.K.14
Webb, B.C.15
Wright, S.L.16
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2
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79951860992
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Evolution and outlook of TSV and 3D IC/Si integration
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Singapore, Dec.
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J. H. Lau, "Evolution and outlook of TSV and 3D IC/Si integration," 12th Electronics Packaging Technology Conference (EPTC), Singapore, Dec.2010, pp.560-570.
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(2010)
12th Electronics Packaging Technology Conference (EPTC)
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Lau, J.H.1
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3
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33845571282
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A CMOS-compatible process for fabricating electrical through-vias in silicon
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San Diego, CA, USA, May
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th Electronic Components and Technology Conf San Diego, CA, USA, May, 2006, pp. 831-837.
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(2006)
th Electronic Components and Technology Conf
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Andry, P.S.1
Tsang, C.2
Sprogis, E.3
Patel, C.4
Wright, S.L.5
Webb, B.C.6
Buchwalter, L.P.7
Manzer, D.8
Horton, R.9
Polastre, R.10
Knickerbocker, J.11
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4
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62249169291
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Copper electrodeposition for 3D integration
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Nice, April
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Rozalia Beica, Charles Sharbono, Tom Ritzdorf, "Copper Electrodeposition for 3D Integration," DTIP of MEMS & MOMEM, Nice, April, 2008, pp.127-131.
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(2008)
DTIP of MEMS & MOMEM
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Beica, R.1
Sharbono, C.2
Ritzdorf, T.3
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5
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54249125500
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Filling of very fine via holes for three dimensional packaging by using ionized metal plasma sputtering and electroplating
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Byeong-Hoon Cho, Jae-Jin Yun, and Won-Jong Lee, "Filling of very fine via holes for three dimensional packaging by using ionized metal plasma sputtering and electroplating," Jpn. J. Appl Phys. 46 (2007) pp. L1135-L1137.
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Cho, B.-H.1
Yun, J.-J.2
Lee, W.-J.3
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6
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70349684361
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Electrografted seed layers for metallization of deep TSV structures
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San Diego, CA, USA, May
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th Electronic Components and Technology Conf San Diego, CA, USA, May.2009, pp. 1147-1152.
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(2009)
th Electronic Components and Technology Conf
, pp. 1147-1152
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Raynal, F.1
Zahraoui, S.2
Frederich, N.3
Gonzalez, J.4
Couturier, B.5
Truzzi, C.6
Lerner, S.7
Alchimer, S.A.8
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7
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50949121640
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An evaluation of electrografted copper seed layers for enhanced metallization of deep TSV structures
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Burlingame, CA, USA, June
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Ledain, S. Bunel, C. Mangiagalli, P. Carles, A. Frederich, N. Delbos, E. Omnes, L. Etcheberry, A. "An evaluation of electrografted copper seed layers for enhanced metallization of deep TSV structures," International Interconnect Technology Conference, Burlingame, CA, USA, June. 2008, pp. 159-161.
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(2008)
International Interconnect Technology Conference
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Ledain, S.1
Bunel, C.2
Mangiagalli, P.3
Carles, A.4
Frederich, N.5
Delbos, E.6
Omnes, L.7
Etcheberry, A.8
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8
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70349665789
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TSV metallization: A novel approach for insulation/barrier/copper seed layer deposition basedon wet electrografting and chemical grafting technologies
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Boston, MA, Dec.
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Suhr, D. et al., "TSV metallization: a novel approach for insulation/barrier/copper seed layer deposition basedon wet electrografting and chemical grafting technologies," Proc. MRS Fall Conf, Boston, MA, Dec. 2008, pp. 247-255.
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(2008)
Proc. MRS Fall Conf
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Suhr, D.1
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9
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70349684361
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Electrografted seed layers for metallization of deep TSV structures
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CA, USA, May
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th Electronic Components and Technology Conf San Diego, CA, USA, May.2009, pp. 1147-1152.
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(2009)
th Electronic Components and Technology Conf San Diego
, pp. 1147-1152
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Raynal, F.1
Zahraoui, S.2
Frederich, N.3
Gonzalez, J.4
Couturier, B.5
Truzzi, C.6
Lerner, S.7
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10
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51349135631
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Integration of high aspect ratio tapered silicon via for through-silicon interconnection
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Lake Buena Vista, FL, USA, May
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th Electronic Components and Technology Conf Lake Buena Vista, FL, USA, May.2008, pp.859 - 865.
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(2008)
th Electronic Components and Technology Conf
, pp. 859-865
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Ranganathan, N.1
Ebin, L.2
Linn, L.3
Vincent, L.W.S.4
Navas, O.K.5
Kripesh, V.6
Balasubramanian, N.7
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