Dielectrically stabilized electrowetting on AF1600/Si3N 4/TiO2 dielectric composite film

Sensors and Actuators, B: Chemical

Volumn 160, Issue 1, 2011, Pages 1593-1598

  Lee, June Kyoo ^a   Park, Kyung Woo ^a   Kim, Hak Rin ^a   Kong, Seong Ho ^a  

^a Kyungpook National University   (South Korea)

Author keywords

Amorphous fluoropolymer; Contact angle; Electrowetting on dielectric (EWOD); Silicon nitride; Titanium dioxide

Indexed keywords

CONTACT ANGLE HYSTERESIS; CURRENT LEAKAGE; DIELECTRIC COMPOSITES; DIELECTRIC STRENGTHS; ELECTRO WETTING; ELECTROWETTING ON DIELECTRICS; FLUOROPOLYMER; MULTI-LAYERED; RELATIVE PERMITTIVITY; THIN FLUOROPOLYMER FILM; TIO;

AMORPHOUS SILICON; COMPOSITE FILMS; CONTACT ANGLE; DIELECTRIC MATERIALS; FLUORINE CONTAINING POLYMERS; OXIDES; SILICON NITRIDE; TITANIUM; TITANIUM DIOXIDE; TITANIUM NITRIDE; WETTING;

DIELECTRIC DEVICES;

EID: 81155134844     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2011.09.074     Document Type: Article

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