Reversible electrowetting on silanized silicon nitride

Sensors and Actuators, B: Chemical

Volumn 144, Issue 2, 2010, Pages 380-386

  Cahill, Brian P ^a   Giannitsis, Athanasios T ^a   Land, Raul ^a,b   Gastrock, Gunter ^a   Pliquett, Uwe ^a   Frense, Dieter ^a   Min, Mart ^a,b   Beckmann, Dieter ^a  

^a Institute for Bioprocessing and Analytical Measurement Techniques   (Germany)

^b TALLINN UNIVERSITY OF TECHNOLOGY   (Estonia)

Author keywords

Contact angle hysteresis; Dielectric breakdown; Electrowetting on dielectric (EWOD); Hydrophobicity; Silanization

Indexed keywords

CONTACT ANGLE HYSTERESIS; DIELECTRIC BREAKDOWNS; ELECTROWETTING ON DIELECTRIC (EWOD); ELECTROWETTING ON DIELECTRICS; SILANIZATIONS;

DIELECTRIC DEVICES; DROP FORMATION; ELECTRIC BREAKDOWN; ELECTRODES; HYDROPHOBICITY; HYSTERESIS; LEAKAGE CURRENTS; LIQUIDS; MONOLAYERS; PHOTORESISTS; PLASMA DEPOSITION; SILICA; SILICON NITRIDE;

CONTACT ANGLE;

EID: 75949087393     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2008.12.041     Document Type: Article

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