Illuminating the connection between contact angle saturation and dielectric breakdown in electrowetting through leakage current measurements

Journal of Applied Physics

Volumn 103, Issue 3, 2008, Pages

  Papathanasiou, A G ^a   Papaioannou, A T ^a   Boudouvis, A G ^a  

^a NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE; DIELECTRIC FILMS; ELECTRIC BREAKDOWN; ELECTRIC CURRENT MEASUREMENT; MICROELECTRONICS; THIN FILMS;

CONTACT ANGLE SATURATION; ELECTROWETTING; HIGH SENSITIVITY CURRENT MEASUREMENTS;

LEAKAGE CURRENTS;

EID: 39349092955     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2837100     Document Type: Article

References (18)

1. S. K. Cho, H. J. Moon, and C. -J. Kim, J. Microelectromech. Syst. JMIYET 1057-7157 10.1109/JMEMS.2002.807467 12, 70 (2003).
2. J. Lienemann, A. Greiner, and J. G. Korvink, IEEE Trans. Comput.-Aided Des. ITCSDI 0278-0070 10.1109/TCAD.2005.855890 25, 234 (2006).
3. C. Quilliet and B. Berge, Curr. Opin. Colloid Interface Sci. COCSFL 1359-0294 10.1016/S1359-0294(00)00085-6 6, 34 (2001).
4. M. Vallet, M. Vallade, and B. Berge, Eur. Phys. J. B EPJBFY 1434-6028 10.1007/s100510051186 11, 583 (1999).
5. F. Mugele and J. C. Baret, J. Phys.: Condens. Matter JCOMEL 0953-8984 10.1088/0953-8984/17/28/R01 17, R705 (2005).
6. K. Adamiak, Microfluid. Nanofluid. MNIAAR 1613-4982 10.1007/s10404-006- 0090-y 2, 471 (2006).
7. A. G. Papathanasiou and A. G. Boudouvis, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1905809 86, 164102 (2005).
8. B. Shapiro, H. Moon, R. L. Garrell, and C. J. Kim, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1563828 93, 5794 (2003).
9. H. J. J. Verheijen and M. W. J. Prins, Langmuir LANGD5 0743-7463 10.1021/la990548n 15, 6616 (1999).
10. E. Seyrat and R. A. Hayes, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1383583 90, 1383 (2001).
11. H. Moon, S. K. Cho, R. L. Garrell, and C. J. Kim, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1504171 92, 4080 (2002).
12. J. Kedzierski and S. Berry, Langmuir 22, 5690 (2006). 0743-7463
13. A. Quinn, R. Sedev, and J. Ralston, J. Phys. Chem. B JPCBFK 1089-5647 10.1021/jp040478f 109, 6268 (2005).
14. A. Bateni, S. S. Susnar, A. Amirfazli, and A. W. Neumann, Colloids Surf., A CPEAEH 0927-7757 10.1016/S0927-7757(03)00053-0 219, 215 (2003).
15. S. Nozaki and R. V. Giridhar, IEEE Electron Device Lett. 7, 486 (1986). 0741-3106
16. S. D. Wang, M. N. Chang, C. Y. Chen, and T. F. Lei, Electrochem. Solid-State Lett. ESLEF6 1099-0062 10.1149/1.1990028 8, G233 (2005).
17. M. Nafria, J. Sune, and X. Aymerich, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.353884 73, 205 (1993).
18. S. Holland, IEEE Trans. Nucl. Sci. IETNAE 0018-9499 10.1109/23.467808 42, 423 (1995).