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Current Applied Physics

Volumn 12, Issue 2, 2012, Pages 585-588

Effect of excimer laser annealing on the properties of ZnO thin film prepared by sol-gel method

(3) Kim, Kyoungwon a,b Kim, Sangsig b Lee, Sang Yeol c

a Korea Institute of Science and Technology (South Korea)

b Korea University (South Korea)

c Chongju University (South Korea)

Author keywords

Excimer laser; Laser annealing; ZnO

Indexed keywords

AMORPHOUS ZNO; AS-GROWN; DEEP LEVEL EMISSION; ENERGY DENSITY; EXCIMER LASER ANNEALING; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; ISOPROPANOL SOLUTION; KRF EXCIMER LASER; LASER ANNEALING; LOW QUALITIES; NEAR BAND EDGE EMISSIONS; ROOM TEMPERATURE; TREATMENT PROCESS; UV REGION; VISIBLE REGION; ZINC ACETATE; ZNO; ZNO THIN FILM;

AMORPHOUS FILMS; ANNEALING; DEPOSITION; EXCIMER LASERS; GELS; METALLIC FILMS; OPTICAL FILMS; SCANNING ELECTRON MICROSCOPY; SOL-GEL PROCESS; SOL-GELS; SOLS; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC COMPOUNDS;

ZINC OXIDE;

EID: 81155123054 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2011.09.006 Document Type: Article

Times cited : (37)

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