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Volumn 52, Issue 9, 2011, Pages 1764-1767
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Preparation of highly textured ZnO thin films by pulsed electron deposition
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Author keywords
Pulsed electron deposition; Thin film; ZnO
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Indexed keywords
DEPOSITION PARAMETERS;
HIGH QUALITY;
OXYGEN PRESSURE;
PULSE FREQUENCIES;
PULSED ELECTRON DEPOSITION;
SI (100) SUBSTRATE;
SUBSTRATE TEMPERATURE;
ZNO;
ZNO THIN FILM;
DEPOSITION;
ELECTRON SOURCES;
ELECTRONS;
FILM GROWTH;
FILM PREPARATION;
METALLIC FILMS;
OPTICAL FILMS;
SEMICONDUCTING SILICON COMPOUNDS;
SUBSTRATES;
THIN FILMS;
ZINC OXIDE;
VAPOR DEPOSITION;
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EID: 80655132310
PISSN: 13459678
EISSN: None
Source Type: Journal
DOI: 10.2320/matertrans.M2011141 Document Type: Article |
Times cited : (5)
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References (23)
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