Different parameters for the deposition of La1.85Sr0.15CuO4 and Nd1.85Ce0.15CuO4 superconducting films by the novel pulsed electron deposition technique

Physica C: Superconductivity and its Applications

Volumn 453, Issue 1-2, 2007, Pages 64-69

  Guo, Y F ^a,b   Chen, L M ^b   Li, P G ^a   Shen, J Q ^a   Guo, X ^b   Lei, M ^b   Tang, W H ^a  

^a ZHEJIANG SCI TECH UNIVERSITY   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

Deposition parameters; High TC superconductor films; La1.85Sr0.15CuO4 and Nd1.85Ce0.15CuO4; Pulsed electron deposition technique

Indexed keywords

ANNEALING; DEPOSITION; LANTHANUM COMPOUNDS; PRESSURE EFFECTS; SUPERCONDUCTIVITY;

DEPOSITION PRESSURE; PULSE FREQUENCY; PULSED ELECTRON DEPOSITION; SUBSTRATE TEMPERATURE;

SUPERCONDUCTING FILMS;

EID: 33847213579     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2006.12.013     Document Type: Article

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