Controlling optical properties and surface morphology of dry etched porous silicon

Journal of Nanophotonics

Volumn 5, Issue 1, 2011, Pages

  Cheung, Maurice C ^a   Roche, Philip J R ^a   Hajj Hassan, Mohamad ^a,b   Kirk, Andrew K ^a   Mi, Zetian ^a   Chodavarpu, Vamsy P ^a  

^a MCGILL UNIVERSITY   (Canada)

^b LEBANESE INTERNATIONAL UNIVERSITY   (Lebanon)

Author keywords

hydrofluoric acid; pore size; porous silicon; reflectance; xenon difluoride etching

Indexed keywords

DRY ETCHING; HYDROFLUORIC ACID; MORPHOLOGY; OPTICAL PROPERTIES; PORE SIZE; REFLECTION; SURFACE MORPHOLOGY;

GAS PHASE ETCHING; LARGE SURFACES; OPTICAL REFLECTANCE; PORE DISTRIBUTION; PROCESS CONDITION; SENSOR DEVELOPMENT; SYSTEMATIC OPTIMIZATION; XENON DIFLUORIDE ETCHING;

POROUS SILICON;

EID: 80655128199     PISSN: None     EISSN: 19342608     Source Type: Journal    
DOI: 10.1117/1.3571270     Document Type: Article

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