Facile fabrication of lateral nanowire wrap-gate devices with improved performance

Applied Physics Letters

Volumn 99, Issue 17, 2011, Pages

  Dhara, Sajal ^a   Sengupta, Shamashis ^a   Solanki, Hari S ^a   Maurya, Arvind ^a   Pavan R , Arvind ^a   Gokhale, M R ^a   Bhattacharya, Arnab ^a   Deshmukh, Mandar M ^a  

^a TATA INSTITUTE OF FUNDAMENTAL RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER HEIGHTS; CHEMICAL ETCHING; E-BEAM LITHOGRAPHY; FABRICATION TECHNIQUE; FACILE FABRICATION; FIELD-EFFECT MOBILITIES; HIGH-CAPACITIVE; PROCESS USE; SUBTHRESHOLD SLOPE; TEMPERATURE RANGE;

NANOWIRES;

EID: 80555139906     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3634010     Document Type: Article

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