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Current Applied Physics

Volumn 11, Issue 4 SUPPL., 2011, Pages

Effects of an Al interlayer on the formation of Pt film on TiO 2/Pt/Si structures

(8) Rahman, Mohammad Arifur b Kim, Ara a Lee, Chiyoung a Han, Jungseok a Soh, Hoesup a Nam, Ho Seok a Ruh, Hyun c Lee, Jaegab a

a Kookmin University (South Korea)

b UNIVERSITY OF DHAKA (Bangladesh)

c Korea Research Institute of Standards and Science (South Korea)

Author keywords

Al; Interlayer; Pt; SEM; TiO2; XRD

Indexed keywords

ADHESION PROPERTIES; BOND FORMATION; DEGREE OF CRYSTALLINITY; ENHANCED GROWTH; HYDROXYL GROUPS; INTERLAYER; PT FILMS; TIO; XRD;

CHEMICAL BONDS; DIFFRACTION; PLATINUM; TITANIUM DIOXIDE; X RAY DIFFRACTION;

ALUMINUM;

EID: 80455164666 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2011.07.020 Document Type: Conference Paper

Times cited : (2)

References (19)

1
- 22144442002
- I.G. Baek Tech. Dig. Int. Electron Devices Meet. 2004 587
- (2004) Tech. Dig. Int. Electron Devices Meet. , pp. 587
- Baek, I.G.¹

2
- 19944434155
- S. Seo Appl. Phys. Lett. 85 2004 5655
- (2004) Appl. Phys. Lett. , vol.85 , pp. 5655
- Seo, S.¹

3
- 21044457267
- S. Seo Appl. Phys. Lett. 86 2005 093509
- (2005) Appl. Phys. Lett. , vol.86 , pp. 093509
- Seo, S.¹

4
- 33748488301
- I.G. Baek Tech. Dig. Int. Electron Devices Meet. 2005 769
- (2005) Tech. Dig. Int. Electron Devices Meet. , pp. 769
- Baek, I.G.¹

5
- 57049136662
- S.H. Won, S.H. Go, K.W. Lee, and J.G. Lee Electron. Mater. Lett. 4 2008 29
- (2008) Electron. Mater. Lett. , vol.4 , pp. 29
- Won, S.H.¹ Go, S.H.² Lee, K.W.³ Lee, J.G.⁴

6
- 70349680753
- S. Go, K. Jeong, K. Lee, A. Kim, H. Ruh, C.S. Kim, and J.G. Lee J. Vac. Sci. Technol. B 27 5 2009 2175
- (2009) J. Vac. Sci. Technol. , vol.27 B , Issue.5 , pp. 2175
- Go, S.¹ Jeong, K.² Lee, K.³ Kim, A.⁴ Ruh, H.⁵ Kim, C.S.⁶ Lee, J.G.⁷

7
- 1642624584
- J. Goswami, C.-G. Wang, W. Cao, and S.K. Dey Chem. Vap. Deposition 9 2003 213
- (2003) Chem. Vap. Deposition , vol.9 , pp. 213
- Goswami, J.¹ Wang, C.-G.² Cao, W.³ Dey, S.K.⁴

8
- 33646543320
- R. Chen, and S.F. Bent Adv. Mater. 18 2006 1086
- (2006) Adv. Mater. , vol.18 , pp. 1086
- Chen, R.¹ Bent, S.F.²

9
- 35548989676
- X. Jiang, and S.F. Bent J. Electrochem. Soc. 154 2007 D648
- (2007) J. Electrochem. Soc. , vol.154 , pp. 648
- Jiang, X.¹ Bent, S.F.²

10
- 0015630630
- M.J. Rand J. Electrochem. Soc. 120 1973 686
- (1973) J. Electrochem. Soc. , vol.120 , pp. 686
- Rand, M.J.¹

11
- 36448998815
- B.S. Kwak, P.N. Frist, A. Erbil, B.J. Wilkens, J.D. Budai, M.F. Chisholm, and L.A. Boatner J. Appl. Phys. 72 1992 3735
- (1992) J. Appl. Phys. , vol.72 , pp. 3735
- Kwak, B.S.¹ Frist, P.N.² Erbil, A.³ Wilkens, B.J.⁴ Budai, J.D.⁵ Chisholm, M.F.⁶ Boatner, L.A.⁷

12
- 0040554711
- F. Argall Solid State Electr 11 1968 535
- (1968) Solid State Electr , vol.11 , pp. 535
- Argall, F.¹

13
- 34248671691
- H. Schroeder, and D.S. Jeong Microelectron. Eng. 84 2007 1982
- (2007) Microelectron. Eng. , vol.84 , pp. 1982
- Schroeder, H.¹ Jeong, D.S.²

14
- 33750187879
- K.M. Kim, B.J. Choi, D.S. Jeong, C.S. Hwang, and S.W. Han Appl. Phys. Lett. 89 2006 162912
- (2006) Appl. Phys. Lett. , vol.89 , pp. 162912
- Kim, K.M.¹ Choi, B.J.² Jeong, D.S.³ Hwang, C.S.⁴ Han, S.W.⁵

15
- 77957666602
- A. Kim, H. Park, K. lee, K. Jeong, C. Kim, E. Lee, and J.G. Lee Electron. Mater. Lett. 5 1 2009 35
- (2009) Electron. Mater. Lett. , vol.5 , Issue.1 , pp. 35
- Kim, A.¹ Park, H.² Lee, K.³ Jeong, K.⁴ Kim, C.⁵ Lee, E.⁶ Lee, J.G.⁷

16
- 34547504489
- J. Lee, H.J. Park, S.H. Won, K.H. Jeong, H.S. Jung, C. Kim, H.J. Bang, C.M. Lee, J.H. Kim, G.C. Kwon, H.L. Cho, H.S. Soh, and J.G. Lee J. Electrochem. Soc. 154 9 2007 H833
- (2007) J. Electrochem. Soc. , vol.154 , Issue.9 , pp. 833
- Lee, J.¹ Park, H.J.² Won, S.H.³ Jeong, K.H.⁴ Jung, H.S.⁵ Kim, C.⁶ Bang, H.J.⁷ Lee, C.M.⁸ Kim, J.H.⁹ Kwon, G.C.¹⁰ Cho, H.L.¹¹ Soh, H.S.¹² Lee, J.G.¹³

17
- 80455171345
- S. Won, S. Go, W. Lee, K. Jeong, H. Jung, C. Lee, E. Lee, and J.G. lee Metals Mater. Int. 14 2008 00
- (2008) Metals Mater. Int. , vol.14 , pp. 00
- Won, S.¹ Go, S.² Lee, W.³ Jeong, K.⁴ Jung, H.⁵ Lee, C.⁶ Lee, E.⁷ Lee, J.G.⁸

18
- 0031672154
- R. Wang, K. Hashimoto, A. Fujishima, M. Chikuni, E. Kojima, A. Kitamura, M. Shimohigoshi, and T. Watanabe Adv. Mater. 10 135 1998
- (1998) Adv. Mater. , vol.10 , Issue.135
- Wang, R.¹ Hashimoto, K.² Fujishima, A.³ Chikuni, M.⁴ Kojima, E.⁵ Kitamura, A.⁶ Shimohigoshi, M.⁷ Watanabe, T.⁸

19
- 0021500781
- J.Y. Tsao, and D.J. Ehrlich J. Appl. Phys. Lett. 45 1984 617
- (1984) J. Appl. Phys. Lett. , vol.45 , pp. 617
- Tsao, J.Y.¹ Ehrlich, D.J.²

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