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Applied Surface Science

Volumn 258, Issue 3, 2011, Pages 1058-1061

Broadband antireflection of silicon nanorod arrays prepared by plasma enhanced chemical vapor deposition

(6) Wang, Desheng a Yang, Zhibo a Li, Fei a Liu, Dequan a Wang, Peng a He, Deyan a

a LANZHOU UNIVERSITY (China)

Author keywords

Antireflection; Electrodeposition; Si nanorods; VHF PECVD

Indexed keywords

ELECTRODEPOSITION; ELECTRODES; INFRARED DEVICES; NANOCRYSTALLINE SILICON; NANOCRYSTALS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFLECTION;

ANTI-REFLECTION; BROADBAND ANTI REFLECTIONS; ELECTRO-DEPOSITED NICKEL; NANOCRYSTALLINE SI; NEAR INFRARED REGION; REFLECTANCE VALUES; VERY HIGH FREQUENCY PLASMA; VHF-PECVD;

NANORODS;

EID: 80455160301 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.08.129 Document Type: Article

Times cited : (6)

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