Fabrication of nonlinear optical devices in ionically self-assembled monolayers

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 1, 2009, Pages

  Kroetch, Aruna ^a   Buswell, Stephen C ^a   Evoy, Stephane ^a   Durak, Cemil ^b   Heflin, J Randy ^b   Kochergin, Vladimir ^c   Duncan, Roger ^c  

^a UNIVERSITY OF ALBERTA   (Canada)

^b VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

^c LUNA INNOVATIONS INC   (United States)

Author keywords

Ionically self assembled monolayers; Nanoimprint lithography; Nonlinear optical materials; Photonic crystals

Indexed keywords

ELECTRON BEAMS; FABRICATION; FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARMONIC GENERATION; NANOIMPRINT LITHOGRAPHY; NONLINEAR OPTICS; OPTICAL MATERIALS; PHOTOELECTRON SPECTROSCOPY; PHOTONIC CRYSTALS; PHOTONIC DEVICES; REACTIVE ION ETCHING; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL COMPOSITIONS; FABRICATION PROCESS; FABRICATION TECHNIQUE; HOLE DIAMETER; LATTICE SPACING; NANO-IMPRINT; NANO-IMPRINTING; NANO-IMPRINTING PROCESS; NON-LINEAR OPTICAL; NON-LINEAR OPTICAL MATERIAL; NONLINEAR OPTICAL DEVICES; NONLINEAR PHOTONIC DEVICES; NONLINEAR PROPERTIES; PHOTONIC STRUCTURE; POTENTIAL IMPACTS; THERMAL CYCLE;

SELF ASSEMBLED MONOLAYERS;

EID: 80455134780     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3066521     Document Type: Review

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