SU-8 protective layer in photo-resist patterning on As2S3 film

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 8, Issue 11-12, 2011, Pages 3183-3186

  Choi, Duk Yong ^a   Madden, Steve ^a   Bulla, Douglas ^a   Rode, Andrei ^a   Wang, Rongping ^a   Luther Davies, Barry ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

As2S3; Chalcogenide glass; SU 8 protective layer; Waveguides

Indexed keywords

ALKALINE DEVELOPER; AMORPHOUS CHALCOGENIDE; AS2S3; BENDING STRUCTURES; CHALCOGENIDE GLASS; CHARACTERISATION; COATING FEATURES; ENHANCED SURFACE; FABRICATION PROCESS; INTERMEDIATE LAYERS; NON-LINEAR OPTICAL; NON-LINEARITY; PHOTOLITHOGRAPHIC PROCESS; PROPAGATION LOSS; PROTECTIVE LAYERS;

AMORPHOUS FILMS; ARSENIC; ATOMIC LAYER DEPOSITION; PHASE CHANGE MEMORY; PHOTOLITHOGRAPHY; WAVEGUIDES;

ELECTRIC LOSSES;

EID: 80155189455     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201000741     Document Type: Article

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